Wetting properties of titanium oxides, oxynitrides and nitrides obtained by DC and pulsed magnetron sputtering and cathodic arc evaporation

Colović, B. and Kisic, D. and Jokanovic, B. and Rakocevic, Z. and Nasov, I. and Trajkovska-Petkoska, Anka and Jokanovic, V. (2019) Wetting properties of titanium oxides, oxynitrides and nitrides obtained by DC and pulsed magnetron sputtering and cathodic arc evaporation. Materials Science-Poland, 37 (2). 173-`181.

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Official URL: http://www.materialsscience.pwr.wroc.pl/ DOI: 10.2...

Abstract

Thin films of titanium oxides, titanium oxynitrides and titanium nitrides were deposited on glass substrates by the methods of direct current (DC) and pulsed magnetron sputtering and cathodic arc evaporation. Phase analysis of the deposited films by X-ray diffraction (XRD) and Fourier-transform infrared spectroscopy (FT-IR) showed the presence of phases with various Ti oxidative states, which indicated a high concentration of oxygen vacancies. The films morphology was investigated by scanning electron microscopy (SEM). Investigations of the films wettability, either with water or ethylene glycol, showed that it depends directly on the concentration of oxygen vacancies. The wettability mechanism was particularly discussed.

Item Type: Article
Subjects: Scientific Fields (Frascati) > Engineering and Technology > Materials engineering
Divisions: Faculty of Technology and Technical Sciences
Depositing User: Prof. d-r. Anka Trajkovska
Date Deposited: 16 Mar 2020 09:06
Last Modified: 16 Mar 2020 09:06
URI: http://eprints.uklo.edu.mk/id/eprint/4141

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